9912052v2

related topics
{photon, photons, single}
{light, field, probe}
{wave, scattering, interference}
{classical, space, random}
{state, phys, rev}
{cos, sin, state}
{operator, operators, space}
{state, states, entangled}
{phase, path, phys}
{energy, gaussian, time}
{state, states, coherent}
{qubit, qubits, gate}
{entanglement, phys, rev}
{algorithm, log, probability}
{time, systems, information}
{equation, function, exp}
{time, wave, function}

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat The Diffraction Limit

Agedi N. Boto, Pieter Kok, Daniel S. Abrams, Samuel L. Braunstein, Colin P. Williams, Jonathan P. Dowling

abstract: Classical, interferometric, optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result surpasses the usual classical diffraction limit by a factor of N. Since the number of features that can be etched on a two-dimensional surface scales inversely as the square of the feature size, this allows one to write a factor of N^2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric downconversion. It is shown how to write arbitrary 2D patterns by using this method.

oai_identifier:
oai:arXiv.org:quant-ph/9912052
categories:
quant-ph
comments:
9 pages, 2 figures
doi:
10.1103/PhysRevLett.85.2733
arxiv_id:
quant-ph/9912052
journal_ref:
Phys. Rev. Lett. 85, 2733 (2000)
created:
1999-12-10
updated:
2000-05-03

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