|
related topics |
{photon, photons, single} |
{wave, scattering, interference} |
{cos, sin, state} |
{equation, function, exp} |
{algorithm, log, probability} |
{state, states, coherent} |
{let, theorem, proof} |
{qubit, qubits, gate} |
{states, state, optimal} |
{state, states, entangled} |
{light, field, probe} |
|
Quantum interferometric optical lithography:towards arbitrary
two-dimensional patterns
Pieter Kok, Agedi N. Boto, Daniel S. Abrams, Colin P. Williams, Samuel L. Braunstein, Jonathan P. Dowling
abstract: As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum
lithography offers an increase in resolution below the diffraction limit. Here,
we generalize this procedure in order to create patterns in one and two
dimensions. This renders quantum lithography a potentially useful tool in
nanotechnology.
- oai_identifier:
- oai:arXiv.org:quant-ph/0011088
- categories:
- quant-ph
- comments:
- 9 pages, 5 figures Revtex
- doi:
- 10.1103/PhysRevA.63.063407
- arxiv_id:
- quant-ph/0011088
- journal_ref:
- Phys. Rev. A 63, 063407 (2001)
- created:
- 2000-11-21
- updated:
- 2001-05-09
Full article ▸
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